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Colloquium on "Application of plasma technology to surface processing - recent developments in modelling and diagnostics for process control and optimization" on Thursday, 30 March 1995 /

Bibliographic Details
Corporate Authors: Colloquium on "Application of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization" London, England), IEEE XPlore Conference Proceedings Online., Institution of Electrical Engineers. Professional Group S3 (Electron Physics, Discharges and Applications), Institution of Electrical Engineers. Science, Education, and Technology Division.
Format: Online Conference Proceeding Book
Published: London : Institution of Electrical Engineers, 1995.
Series:Colloquium (Institution of Electrical Engineers) ; no. 95/149.
Online Access:Online version
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